Reduction of Surface Contamination Using UVC Irradiation (RedOK)

Description:

Surface contamination occurs frequently in the pharmaceutical manufacturing industry and in compounding pharmacies. This contamination results from unintended release due to disruptions in the manufacturing process. Effective cleaning depends on the surface to be cleaned, the cleaning solution, the cleaning method, and the active ingredient. In some cases, however, a purely mechanical cleaning method is insufficient, leaving residues of toxic substances on the surfaces. Surfaces that are not completely cleaned can lead to secondary contamination, for example on packaging materials or gloves, and thereby cause contamination on nonprotected areas.

One possible addition on chemical cleaning is the use of physical methods, such as irradiation with short-wavelength light. The UV degradation of organic compounds is based on the absorption of high-energy ultraviolet radiation, which can cleave chemical bonds and generate reactive intermediates. In direct photolysis, organic molecules absorb UV radiation, leading to the cleavage of bonds and the breakdown into smaller fragments.

Oxidation and decomposition alter the physicochemical properties of the residues, thereby changing the polarity of the products and enabling improved mechanical removal.